Friday, September 29, 2017

Wafer Chuck Table Cleaning Wafer



Cleaning Material for Wafer Chuck Table Cleaning Wafer®
The Cleaning Wafer is for removing small particles on the robot arms or chuck tables of semiconductor-manufacturing equipment.

The Cleaning Wafer, having a special cleaning layer, can remove small particles in the semiconductor manufacturing equipment. Down-time of tools can be drastically reduced by using the cleaning wafer, compared with the ordinal hand cleaning method. The cleaning wafer can also be used for preventive maintenance so that yield improvement can be expected.
Applications
·         Especially for vacuum chamber in semiconductor front-end process where particle trouble happens.
·         All mid-end process of semiconductor manufacturing equipment.

·         Chuck table or stage which cannot be cleaned by hand.

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