semiXicon: April 2024

Tuesday, April 30, 2024

ESD Safe End Effector

Extra durable and low contact

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AMAT KLA, BRUKER

0200-18093 0200-01009

CVD AMAT ULTIMA 0200-18093

NOZZLE ALL CERAMIC 2.55L, 1.5% HDP-CVD, ULTIMA

APPLIED MATERIALS NOZZLE 4-HOLES 60 DEG, BAFFLE, ULTIMA 1. 0200-01009

Monday, April 29, 2024

AMAT 0200-02892 Robot Arm End Effector

Rev: Silicon Carbide Version

Made by

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Assy 6 Inch Wafer Chuck, Ultratech PN 01-20-04705-06

Wafer Chuck Table Expert

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Friday, April 26, 2024

Ultratech Stepper 300mm Round Wafer Chuck Vacuum Plate Aluminum with Center Hole

Internal Hollow Ceramic Plate

Cooling or heating channel integrated

Alumina Oxide or Aluminum Nitride Ceramic

Semiconductor wafer processing

300mm, 350mm, 450mm ...

Double sides working porous ceramic vacuum chuck table

Different pore sizes of the front and the back sides

www.cerameric.com

Thursday, April 25, 2024

CMP Grinding Pad

Ceramic ,CBN, Diamond CMP Grinding Pad

Diamond grit size, pitch, surface flatness ,roughness etc customizable.

www.semixicon.com

Ceramic, CBN, Diamond wafer grinding wheel

Ceramic, CBN, Diamond wafer grinding wheel

Silicon nitride (Si3N4)

Silicon Nitride Ceramic Components Machining ---For the most extreme environment

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Silicon Nitride is one of the highest performing technical ceramics from across both the oxide and non-oxide groups. It was first developed in the 1960s when materials science and engineering was acknowledged as a field of study with comparable value to that of metallurgy. The underlying goal of most ceramics research in the ‘60s and ‘70s was to develop compact engineering materials with high strength, and toughness. Silicon nitride succeeded on all fronts.

Silicon Nitride—Chemistry & Microstructure

Silicon nitride is a ceramic that exists in three distinct crystallographic phases: α, β, and γ. Both alpha and beta-phase silicon nitride are comprised of corner-sharing, tetrahedral SiN4 with short, strong Si-N bonds. The result is an extremely rigid 3D framework of compactly layered silicon and nitrogen atoms.

The microstructure of silicon nitride ceramics is strongly dependent on the densification mechanism. Typically, α-Si3N4 is used as a starting powder as it transitions to the more chemically stable β-phase when fired. Although grain size and shape vary depending on the properties of the starting powder and the presence of additives, β-Si3N4 typically consists of elongated grains that interlock in a tightly compacted microstructure.

Properties of Silicon Nitride

material, silicon carbide, nitride bonded, chromium oxide, alumina oxide

Low density (3.17 g/cm3)
High fracture toughness (7 MPa m1/2)
Excellent flexural strength (850 MPa)
Exceptional thermal shock resistance
High maximum operating temperatures

Silicon nitride can readily be deployed in some of the world’s toughest working environments, owing to its unique intersection of chemical and thermodynamic properties. Hot pressed silicon nitride offers excellent high-temperature performance and is ideal for seal face components challenging conditions, including boiler water reactor pumps, pressurized water reactor pumps, corrosive borated water service, and within rotating bearings.

Pump components comprised of silicon nitride are also used in the oil and gas sector, and throughout the petrochemical industry at large. The chemical integrity of Si3N4 makes it suitable for surfaces within pumps (impellers, shafts, seals, etc.) that routinely come into contact with abrasive slurries and corrosive fluids.