www.semixicon.com
Thursday, November 30, 2017
Wednesday, November 29, 2017
Tuesday, November 7, 2017
Friday, November 3, 2017
Thin Film Deposition and Fluorine Etch Process Wafer Chucks
Thin Film Deposition and Fluorine Etch Process Wafer Chucks
Applications:
Semiconductor
Photonics
Research & Development
Pilot Run
Mass Production
www.semixicon.com
Wednesday, November 1, 2017
Aluminum Nitride Sputtering Targets
Aluminum
Nitride Sputtering Targets
Sputtering
targets, evaporation sources and other deposition materials.
Composition: AlN
Density: Above 99%
Purity: Above 99.99%
Size: 800mm X 300mm X 6~14mmT
Application: Flat panel displays (monitors, TVs, etc.)
Related products: ZnO target, IGZO target, ZrO2 target, TiO2 target, ITO tablet
Density: Above 99%
Purity: Above 99.99%
Size: 800mm X 300mm X 6~14mmT
Application: Flat panel displays (monitors, TVs, etc.)
Related products: ZnO target, IGZO target, ZrO2 target, TiO2 target, ITO tablet
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