Aspect | Silicon-based BDD electrode | Nickel-based BDD electrode | Titanium-based BDD electrode |
---|---|---|---|
Substrate/interlayer | Heavily doped Si wafers, often with buffer/carbonized layer | Ni foils, meshes, or coatings | Ti plates/foils, often forming TiC/TiN interface |
Adhesion of diamond film | Moderate; risk of delamination due to stress (Si/diamond mismatch) | Good; Ni ductility buffers stress, but Ni–C phases may weaken long-term adhesion | Excellent; Ti forms stable TiC/TiN interlayer ensuring strong bonding |
Thermal expansion mismatch with diamond | High (leads to residual stress & cracks) | Lower mismatch than Si | Very low mismatch; best stress relief |
Electrochemical window (vs. Ag/AgCl) | Wide (up to ~3.5 V) | Wide, but slightly narrower due to Ni interactions | Wide (similar to Si-BDD, ~3.5 V) |
Corrosion/chemical stability | Si substrate prone to oxidation/corrosion under long-term anodic polarization | Ni corrodes in chloride-containing wastewater; Ni²⁺ release is problematic | Ti highly corrosion-resistant; TiC/TiN barrier protects substrate |
Service lifetime in water treatment | Shorter (substrate degradation limits use) | Moderate (substrate corrosion limits durability) | Longest (excellent lifetime, often >10,000 h reported) |
Pollutant degradation efficiency | High (due to strong •OH radical generation) | High, but can drop with Ni dissolution | High, very stable across repeated cycles |
Cost & scalability | Lower cost (Si wafers), easy to microfabricate, but limited electrode area | Moderate cost, can be made in larger area (foils/meshes) | Higher cost, but robust and widely adopted for industrial water treatment |
Typical applications in water treatment | Lab-scale reactors, sensors, fundamental studies of EAOP | Pilot-scale reactors, electro-Fenton processes, H₂O₂ electrogeneration | Full-scale industrial wastewater treatment, electrochemical oxidation of persistent organic pollutants (POPs) |
No comments:
Post a Comment