Aluminum
Nitride Sputtering Targets
Sputtering
targets, evaporation sources and other deposition materials.
Composition: AlN
Density: Above 99%
Purity: Above 99.99%
Size: 800mm X 300mm X 6~14mmT
Application: Flat panel displays (monitors, TVs, etc.)
Related products: ZnO target, IGZO target, ZrO2 target, TiO2 target, ITO tablet
Density: Above 99%
Purity: Above 99.99%
Size: 800mm X 300mm X 6~14mmT
Application: Flat panel displays (monitors, TVs, etc.)
Related products: ZnO target, IGZO target, ZrO2 target, TiO2 target, ITO tablet
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