Friday, November 3, 2017

Thin Film Deposition and Fluorine Etch Process Wafer Chucks








Thin Film Deposition and Fluorine Etch Process Wafer Chucks

Applications:

Semiconductor
Photonics
Research & Development
Pilot Run
Mass Production

www.semixicon.com

Wednesday, November 1, 2017

Aluminum Nitride Sputtering Targets


Aluminum Nitride Sputtering Targets
Sputtering targets, evaporation sources and other deposition materials. 

Composition: AlN
Density: Above 99%
Purity: Above 99.99%
Size: 800mm X 300mm X 6~14mmT
Application: Flat panel displays (monitors, TVs, etc.)
Related products: ZnO target, IGZO target, ZrO2 target, TiO2 target, ITO tablet