Wednesday, August 10, 2016

Shower Head for Semiconductor





    Shower Head for Semiconductor / MEMS Process
  • Gas Distribution Channel : One , Two, Multi Zone
  • Insulation Material : Anodizing, APS (Al2O3, Y2O3)
    Ceramic (SiC, Y2O3, Al2O3)
  • Applicaton : Dry Etch (Oxide / Poly), CVD
  • Application Wafer Size : ~ 300㎜(φ)
  • * Heating Zone : One Zone, Two Zone, Multi Zone
  • Controllable Temp Range : 0 ~ 150℃

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